Crecimiento de estructuras de carbono mediante deposición química en fase de vapor a baja presión

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Stephanie Mariela Varela-Fonseca
Camila Hernández-Murillo
Ernesto Montero-Zeledón
Dionisio Gutiérrez-Fallas
Roberto Urcuyo
Allen Puente-Urbina

Resumen

Los alótropos de carbono han ganado interés en las últimas décadas debido a sus propiedades y a la gran variedad de posibles aplicaciones tecnológicas que han demostrado. Por dichas razones, la obtención de estos alótropos con diferentes propiedades y coberturas es ampliamente investigado. La Deposición Química en Fase de Vapor (CVD, por sus siglas en inglés) es una de las técnicas más utilizadas para obtener este tipo de materiales con una alta calidad y cobertura en una forma controlada. En CVD, se utilizan metales de transición como catalizadores, fuentes de carbono gaseosas y altas temperaturas. En este reporte, se presentan estructuras de carbono sintetizadas sobre substratos de cobre utilizando Deposición Química en Fase de Vapor a Baja Presión (LPCVD, por sus siglas en inglés) con acetileno como fuente de carbono. Los sustratos de cobre se trataron térmicamente bajo una atmósfera reductora de hidrógeno-argón y luego se expusieron a acetileno, variando el flujo de acetileno y el tiempo de deposición. Los materiales resultantes se caracterizaron mediante Microscopía Óptica y Espectroscopia Raman. El enfoque seguido permitió determinar las mejores condiciones de síntesis de grafeno monocapa, de crecimiento irregular.

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Cómo citar
Varela-Fonseca, S. M., Hernández-Murillo, C., Montero-Zeledón, E., Gutiérrez-Fallas, D., Urcuyo, R., & Puente-Urbina, A. (2022). Crecimiento de estructuras de carbono mediante deposición química en fase de vapor a baja presión. Revista Tecnología En Marcha, 35(4), Pág. 57–70. https://doi.org/10.18845/tm.v36i1.6067
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Biografía del autor/a

Camila Hernández-Murillo, Escuela de Química, Universidad de Costa Rica. Costa Rica. Laboratorio Institucional de Microscopía, Instituto Tecnológico de Costa Rica. Costa Rica.

 

 

 

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