Comparative Study of Steep Switching Devices for 1T Dynamic Memory

Main Article Content

Nupur Navlakha
Hasan Raza Ansari
Leonard Register
Sanjay Banerjee

Abstract

This work focuses on understanding the operation and performance of various steep switching devices (subthreshold slope sub 60 mV/decade), namely Thin-Capacitively Coupled Thyristor (TCCT), Field Effect Diode (FED), Zero sub-threshold swing and Zero impact ionization FET (Z2-FET), and Tunnel Field Effect Transistor (TFET) as capacitorless dynamic memory. Functionality as 1T DRAM depends on creation of potential well which must be induced in a p-i-n structure, achieved through precise doping of p-region (TCCT), asymmetric gate alignment (Z2FET, TFET) and use of two independent gates (FED and twin gate TFET). While TCCT, FED and Z2FET operate in forward bias, TFET operates in reverse bias.  The work shows a comparative analysis of these devices in terms of retention time, sense margin, current ratio, power and speed which are crucial metrics for future DRAMs and also provides a guideline for application specific design.

Article Details

How to Cite
Navlakha, N., Raza Ansari, H., Register, L., & Banerjee, S. (2024). Comparative Study of Steep Switching Devices for 1T Dynamic Memory. Tecnología En Marcha Journal, 37(5), Pág. 110–117. https://doi.org/10.18845/tm.v37i5.7224
Section
Artículo científico

References

Lee S. H., (2016) Technology scaling challenges and opportunities of memory devices, IEEE Electron Devices

Meeting, pp. 1-8.

Okhonin S., Nagoga M., Carman E., Beffa, R., and Faraoni, E., (2007) New generation of Z-RAM, IEEE Electron

Devices Meeting, pp. 925-928.

Cho H.-J., Nemati F., Roy R., Gupta R., Yang K., Ershov M., Banna S., Tarabbia M., Salling C., Hayes D.,

and Mittal A., (2005) A novel capacitor-less DRAM cell using thin capacitively-coupled thyristor (TCCT),

IEEE Electron Devices Meeting, pp. 311-314.

Chakraborty, S., & Kulkarni, J. P. (2022, June). Cryo-TRAM: Gated Thyristor based Capacitor-less DRAM for

Cryogenic Computing, IEEE Device Research Conference.

Badwan A. Z., Chbili Z., Yang Y., Salman A. A., Li Q., and Ioannou D. E., (2013) SOI field-effect diode DRAM

cell: Design and operation, IEEE Electron Device Letters, 34,1002-1004.

Wan J., Le Royer C., Zaslavsky A., and Cristoloveanu S., (2012) A Compact Capacitor-Less High-Speed DRAM

Using Field Effect-Controlled Charge Regeneration, IEEE Electron Device Letters, 2, 179–181.

Cristoloveanu, S., Lee, K.H., Parihar, M.S., El Dirani, H., Lacord, J., Martinie, S., Le Royer, C., Barbe, J.C.,

Mescot, X., Fonteneau, P. and Galy, P., 2018. A review of the Z2-FET 1T-DRAM memory: Operation mechanisms and key parameters. Solid-State Electronics, 143, pp.10-19

Biswas A., Dagtekin N., Grabinski W., Bazigos A., Le Royer C., Hartmann J. M., Tabone C., Vinet M., and

Ionescu A. M., (2014) Investigation of tunnel field-effect transistors as a capacitor-less memory cell, Applied

Physics Letters, 104.

Navlakha, N., Lin, J. T., & Kranti, A. (2016). Improved retention time in twin gate 1T DRAM with tunneling based

read mechanism, IEEE Electron Device Letters, 37(9).